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Optical and structural characterization of silicon nitride thin films deposited by PECVD

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dc.contributor.author Güler, İpek
dc.date.accessioned 2020-02-13T11:14:19Z
dc.date.available 2020-02-13T11:14:19Z
dc.date.issued 2019-07
dc.identifier.citation Guler, I, "Optical and structural characterization of silicon nitride thin films deposited by PECVD", Materials Science and Engineering B-Advanced Functional Solid-State Materials, Vol. 246, pp. 21-26, (2019). tr_TR
dc.identifier.issn 0921-5107
dc.identifier.uri http://hdl.handle.net/20.500.12416/2441
dc.description.abstract Plasma enhanced chemical vapor deposition (PECVD) technique was used to deposit silicon nitride (SiNx) thin films. The silane (SiH4) and ammonia (NH3) were used as reactant gases. Both the flow rates of the NH3 and SiH4 gases were changed but total flow rate kept constant to obtain the different ratio nitrogen (N) in the SiNx films. Fourier transform infrared spectroscopy (FTIR) was used to get information about absorption ratios of the films and the bond types in the films. The refractive index of the films was obtained from ellipsometry measurements. From FTIR measurements and ellipsometry measurements, refractive index for amorphous silicon (Si) and refractive index for stoichiometric SiNx were found as 3.27 and 1.91, respectively. The photoluminescence (PL) measurements were used to see the luminescent of the amorphous Si nanoparticles which were occurred spontaneously during deposition process. High resolution transmission electron microscopy (HRTEM) was used to analyze the Si nanoparticle size. tr_TR
dc.language.iso eng tr_TR
dc.publisher Elsevier tr_TR
dc.relation.isversionof 10.1016/j.mseb.2019.05.024 tr_TR
dc.rights info:eu-repo/semantics/closedAccess tr_TR
dc.subject SINx Thin Films tr_TR
dc.subject Ellipsometry tr_TR
dc.subject FTIR tr_TR
dc.subject PL tr_TR
dc.title Optical and structural characterization of silicon nitride thin films deposited by PECVD tr_TR
dc.type article tr_TR
dc.relation.journal Materials Science and Engineering B-Advanced Functional Solid-State Materials tr_TR
dc.contributor.authorID 101531 tr_TR
dc.identifier.volume 246 tr_TR
dc.identifier.startpage 21 tr_TR
dc.identifier.endpage 26 tr_TR
dc.contributor.department Çankaya Üniversitesi, Ortak Dersler Bölümü, Temel Mühendislik Ana Bilim Dalı, Fizik Bilim Dalı tr_TR


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