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Dynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision system

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dc.contributor.author Hundur, Yakup
dc.contributor.author Güvenç, Büşra
dc.contributor.author Hippler, Rainer
dc.date.accessioned 2016-04-27T09:09:40Z
dc.date.available 2016-04-27T09:09:40Z
dc.date.issued 2008-02
dc.identifier.citation Hundur, Y., Güvenç, Z.B., Hippler, R. (2008). Dynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision system. Chinese Physics Letters, 25(2), 730-733. tr_TR
dc.identifier.issn 0256-307X
dc.identifier.uri http://hdl.handle.net/20.500.12416/917
dc.description.abstract The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data tr_TR
dc.language.iso eng tr_TR
dc.publisher IOP Publishing Ltd tr_TR
dc.rights info:eu-repo/semantics/closedAccess
dc.subject Surface tr_TR
dc.subject Yield tr_TR
dc.title Dynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision system tr_TR
dc.type article tr_TR
dc.relation.journal Chinese Physics Letters tr_TR
dc.contributor.authorID 29853 tr_TR
dc.identifier.volume 25 tr_TR
dc.identifier.issue 2 tr_TR
dc.identifier.startpage 730 tr_TR
dc.identifier.endpage 733 tr_TR
dc.contributor.department Çankaya Üniversitesi, Mühendislik Fakültesi, Elektronik ve Haberleşme Mühendisliği tr_TR


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